With feature sizes shrinking to the nanometer scale, deformities in the trenches become more noticable. The walls of the trenches take on an undulating quality. This quality is known as Line Edge Roughness (LER) or Line Width Roughness (LWR). A novel idea to reduce this LER is being tested using samples supplied by Intel. After exposure the samples are taken to the Center for Microanalysis of Materials (CMM) where a Scanning Electron Microscope (SEM) is used to compare them to non-exposed samples.